Design for Manufacturability and Yield for Nano-Scale CMOS

This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.

Publication Year: 2007
Imprint: Springer Netherlands
Format: H
Weight (Gram): 600